Title: Design for Manufacturability Abstract Design for Manufacturability (DFM) is a design approach that simultaneously considers all of the design goals such as functionality, area, power and performance as well as constraints such as optical patterning limitations including diffraction and etches. Manufacturing yield can be improved through design process. Incorporating design practices to improve manufacturing yield has gained recent attention. In this talk, we will explore photolithography trends and how they restrict designs and describe the process of yield improvement through better physical design as well as yield recovery through test oriented learning process. Presenter Biography Sandip Kundu: Sandip Kundu is Professor of Electrical and Computer Engineering at the University of Massachusetts, Amherst. Previously he was at Intel Corporation (till January 2005). Prior to joining Intel, he was a member of the research staff at the IBM T. J. Watson Research Laboratory (1988-1997). He has published over 85 papers, holds 12 patents and has given 13 tutorials in forums such as ICCAD, EDAC, DATE, ASP-DAC, ATS, ETW and ITC. Sandip has also been in numerous program committees including DAC, ICCAD, DATE and ICCD. He was the technical program chair for ICCD 2000, general chair in 2001. He was the general chair of VLSI conference in India in 2005. He is currently a Distinguished Visitor of IEEE Computer Society, fellow of IEEE and an Associate Editor of IEEE Transactions on VLSI. Previously, he was an associate editor of IEEE Transactions on Computers.